Chip factory's water quality military rules

In the realm of semiconductor ultrapure water (UPW), the water purity standard is termed the 'ceiling level'.
- Resistivity: ≥ 18.2 MΩ-cm (25 ℃), the process target is near the theoretical limit of 18.3 MΩ-cm.
- TOC: ≤ 5 ppb（Type E-1 grade, even at 7 nm process, ≤ 0.5 ppb）

Bacteria: ≤ 1 CFU/100 mL (100mL direct incubation method)

A wafer fab has been attributed to the pH variation of pure water system 0.5, resulting in a 14 nm process interface condition defect rate anomaly Soaring. A DRAM plant even more so owing to production line magnesium ion pollution, which caused gate failure, a single-day scrap wafer of over 3000 pieces, and direct losses of up to $ billion.

These aggressive lessons disclose reverse osmosis chemicals, as well as the gatekeeper of chip results.

When the global chip major figures compete for the 3 nm process, few people realise that before each wafer can be produced, we must first win a battle on the 'water'.

A triple protection line of reverse osmosis chemicals

The first one is the ionic assassin

In filtration systems where the RO membrane pore size is only 0.1~ 0.2 nm, calcium scale formation may trigger a cascading clogging effect.

After scaling the resistivity of the produced water decreased by 0.1 MΩ-cm each, the wafer oxide layer local uniformity deviation increased significantly. A 12-inch wafer fab has been due to magnesium scale accumulation led to RO membrane flux attenuation of 17%, emergency shutdown to replace the membrane column of the direct loss of a million U.S. dollars.

Scale Inhibitor for TRISPE® Series

Through the directed design of organic phosphonate complex molecules that efficiently seizes calcium and magnesium ion nucleation sites, resulting in significant inhibition of RO membrane surface fouling, with a dosage rate of 0.2-0.8 ppm for the highly concentrated formulation. after use in a wafer fab, the membrane element replacement cycle was extended from 18 months to 26 months.

The second weight is bacterial guerrillas

Even after UV + ozone sterilisation, RO membrane biological pollution is still a hidden threat. Experiments show that Pseudomonas aeruginosa can quickly form biofilm on the membrane surface, and its secreted extracellular polymers (e.g. β-glucan) will significantly push up the TOC value of ultrapure water.

Non-Oxidising Biocides for PT-BIO^® Series

Adopting double slow-release technology, it penetrates the biofilm faster than traditional agents and automatically decomposes into non-toxic products. In the practical application in a 3D NAND chip production line, the bacterial count of RO water was controlled stably, and the annual cost of defective products treatment was saved in millions of RMB.

The third weight is cleaning escort

In the precision battlefield of semiconductor ultrapure water systems, each cleaning of RO membranes is an ‘escort operation’, where 0.1 ppb of sodium ion residue is enough to cause permanent deterioration of the membrane group.

Cleaning Agents for PT-ROClean^® Series

Ion imprinted polymer directed capture technology, precision pH regulation, and reverse membrane desalination. In one practical application, it helps to extend RO membrane life, restore membrane flux, and significantly reduce maintenance costs with a single cleaning.

?When mankind carved 0.3 nm transistors on the chip, please don't forget - those pharmaceutical molecules fighting in the RO membrane, with the precise game of molecular bonding, holding up the last 1 nm of Moore's law. And this battle about water is destined to be even more thrilling than the photolithography war.

Polymer is working hard to maintain the industry of semiconductors !Guarding every drop of ultrapure water for 'chip-level' purity - from scale inhibitors, biocides to cleaning agents.

Is there a 'water quality assassin' in your industry?

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